Creation of Silicon Nanostructures in Electric Arc Discharge
- Авторлар: Timerkaev B.A.1, Shakirov B.R.1, Timerkaeva D.B.1
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Мекемелер:
- Kazan National Research Technical University
- Шығарылым: Том 53, № 2 (2019)
- Беттер: 162-166
- Бөлім: Plasma Chemistry
- URL: https://journal-vniispk.ru/0018-1439/article/view/157635
- DOI: https://doi.org/10.1134/S0018143919020152
- ID: 157635
Дәйексөз келтіру
Аннотация
The paper presents methods for growing silicon nanotubes using an electric discharge with different values of the electric field strength in the interelectrode gap. It is shown that the shapes of the grown nanomaterials are significantly influenced by both the surrounding gaseous medium and the electric field strength in the interelectrode gap. The silicon nanostructures obtained have been a rather complex and, at the same time, definitely regular configuration and can be widely used in electronics, photovoltaics, batteries, and even as structural elements in composite materials.
Негізгі сөздер
Авторлар туралы
B. Timerkaev
Kazan National Research Technical University
Хат алмасуға жауапты Автор.
Email: btimerkaev@gmail.com
Ресей, Kazan, 420111
B. Shakirov
Kazan National Research Technical University
Email: btimerkaev@gmail.com
Ресей, Kazan, 420111
D. Timerkaeva
Kazan National Research Technical University
Email: btimerkaev@gmail.com
Ресей, Kazan, 420111
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