Predicting Microdistribution of Metal Electrodeposition Rate from Electrolytes with Positive and Negative Leveling Power


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The relationship between the leveling power of electrolytes, the primary current distribution, and the microdistribution of the metal deposition rate is considered. For electrolytes with positive, zero, and negative leveling power, the calculations of microdistribution of metal deposition rate are carried out with regard to the data on the primary current distribution obtained experimentally for a macromodel of the microprofile under study. Good agreement is demonstrated between the microdistribution calculated using the described method and the results of direct measurements of metal distribution over the surface with the regular twodimensional microprofile.

Sobre autores

S. Kruglikov

Mendeleev University of Chemical Technology

Autor responsável pela correspondência
Email: skruglikov@mail.ru
Rússia, Moscow, 125047

N. Titova

Sechenov First State Medical University

Email: skruglikov@mail.ru
Rússia, Moscow, 119991

N. Nekrasova

Mendeleev University of Chemical Technology

Email: skruglikov@mail.ru
Rússia, Moscow, 125047

E. Kruglikova

Moscow Polytechnical University

Email: skruglikov@mail.ru
Rússia, Moscow, 107023

A. Telezhkina

Mendeleev University of Chemical Technology

Email: skruglikov@mail.ru
Rússia, Moscow, 125047

V. Brodskii

Mendeleev University of Chemical Technology

Email: skruglikov@mail.ru
Rússia, Moscow, 125047

V. Kolesnikov

Mendeleev University of Chemical Technology

Email: skruglikov@mail.ru
Rússia, Moscow, 125047

A. Gubin

Mendeleev University of Chemical Technology

Email: skruglikov@mail.ru
Rússia, Moscow, 125047

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