Specific features of proton interaction with transistor structures having a 2D AlGaN/GaN channel
- Авторлар: Emtsev V.V.1, Zavarin E.E.1, Kozlovskii M.A.1, Kudoyarov M.F.1, Lundin V.V.1, Oganesyan G.A.1, Petrov V.N.1, Poloskin D.S.1, Sakharov A.V.1, Troshkov S.I.1, Shmidt N.M.1, V’yuginov V.N.2, Zybin A.A.2, Parnes Y.M.2, Vidyakin S.I.3, Gudkov A.G.3, Chernyakov A.E.4, Kozlovskii V.V.5
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Мекемелер:
- Ioffe Physical Technical Institute
- Svetlana-Elektronpribor Company
- Bauman Moscow State Technical University
- Submicron Heterostructures for Microelectronics Research and Engineering Center
- Peter the Great St. Petersburg Polytechnic University
- Шығарылым: Том 42, № 11 (2016)
- Беттер: 1079-1082
- Бөлім: Article
- URL: https://journal-vniispk.ru/1063-7850/article/view/201884
- DOI: https://doi.org/10.1134/S1063785016110031
- ID: 201884
Дәйексөз келтіру
Аннотация
It has been shown that the interaction of 1 MeV protons at doses of (0.5–2) × 1014 cm–2 with transistor structures having a 2D AlGaN/GaN channel (AlGaN/GaN HEMTs) is accompanied not only by the generation of point defects, but also by the formation of local regions with a disordered nanomaterial. The degree of disorder of the nanomaterial was evaluated by multifractal analysis methods. An increase in the degree of disorder of the nanomaterial, manifested the most clearly at a proton dose of 2 × 1014 cm–2, leads to several-fold changes in the mobility and electron density in the 2D channel of HEMT structures. In this case, the transistors show a decrease in the source–drain current and an order-of-magnitude increase in the gate leakage current. In HEMT structures having an enhanced disorder of the nanomaterial prior to exposure to protons, proton irradiation results in suppression of the 2D conductivity in the channel and failure of the transistors, even at a dose of 1 × 1014 cm–2.
Авторлар туралы
V. Emtsev
Ioffe Physical Technical Institute
Email: Natalia.Shmidt@mail.ioffe.ru
Ресей, St. Petersburg, 194021
E. Zavarin
Ioffe Physical Technical Institute
Email: Natalia.Shmidt@mail.ioffe.ru
Ресей, St. Petersburg, 194021
M. Kozlovskii
Ioffe Physical Technical Institute
Email: Natalia.Shmidt@mail.ioffe.ru
Ресей, St. Petersburg, 194021
M. Kudoyarov
Ioffe Physical Technical Institute
Email: Natalia.Shmidt@mail.ioffe.ru
Ресей, St. Petersburg, 194021
V. Lundin
Ioffe Physical Technical Institute
Email: Natalia.Shmidt@mail.ioffe.ru
Ресей, St. Petersburg, 194021
G. Oganesyan
Ioffe Physical Technical Institute
Email: Natalia.Shmidt@mail.ioffe.ru
Ресей, St. Petersburg, 194021
V. Petrov
Ioffe Physical Technical Institute
Email: Natalia.Shmidt@mail.ioffe.ru
Ресей, St. Petersburg, 194021
D. Poloskin
Ioffe Physical Technical Institute
Email: Natalia.Shmidt@mail.ioffe.ru
Ресей, St. Petersburg, 194021
A. Sakharov
Ioffe Physical Technical Institute
Email: Natalia.Shmidt@mail.ioffe.ru
Ресей, St. Petersburg, 194021
S. Troshkov
Ioffe Physical Technical Institute
Email: Natalia.Shmidt@mail.ioffe.ru
Ресей, St. Petersburg, 194021
N. Shmidt
Ioffe Physical Technical Institute
Хат алмасуға жауапты Автор.
Email: Natalia.Shmidt@mail.ioffe.ru
Ресей, St. Petersburg, 194021
V. V’yuginov
Svetlana-Elektronpribor Company
Email: Natalia.Shmidt@mail.ioffe.ru
Ресей, St. Petersburg, 194021
A. Zybin
Svetlana-Elektronpribor Company
Email: Natalia.Shmidt@mail.ioffe.ru
Ресей, St. Petersburg, 194021
Ya. Parnes
Svetlana-Elektronpribor Company
Email: Natalia.Shmidt@mail.ioffe.ru
Ресей, St. Petersburg, 194021
S. Vidyakin
Bauman Moscow State Technical University
Email: Natalia.Shmidt@mail.ioffe.ru
Ресей, Moscow, 105005
A. Gudkov
Bauman Moscow State Technical University
Email: Natalia.Shmidt@mail.ioffe.ru
Ресей, Moscow, 105005
A. Chernyakov
Submicron Heterostructures for Microelectronics Research and Engineering Center
Email: Natalia.Shmidt@mail.ioffe.ru
Ресей, St. Petersburg, 194021
V. Kozlovskii
Peter the Great St. Petersburg Polytechnic University
Email: Natalia.Shmidt@mail.ioffe.ru
Ресей, St. Petersburg, 195251
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