Origin of Porous Silicon Photoluminescence Peaks in the Wavelength Range 460–700 nm


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The change in the photoluminescence peaks of porous silicon at λ = 640–670 and 540–560 nm at 300 and 77 K, as well as their behavior after low-temperature annealing of the samples at 500°С, has been studied. The change in these peaks correlated with that in the IR spectra. The peak at 640–670 nm has been explained by the existence Si–OH groups on the porous silicon layers and the peak at 540–560 nm, by the photoluminescence of the silicon matrix per se.

Sobre autores

E. Abramova

Moscow Technological University (Institute of Fine Chemical Technologies)

Email: anavenko@yandex.ru
Rússia, Moscow

A. Khort

Moscow Technological University (Institute of Fine Chemical Technologies)

Autor responsável pela correspondência
Email: anavenko@yandex.ru
Rússia, Moscow

A. Yakovenko

Moscow Technological University (Institute of Fine Chemical Technologies)

Email: anavenko@yandex.ru
Rússia, Moscow

M. Tsygankova

Moscow Technological University (Institute of Fine Chemical Technologies)

Email: anavenko@yandex.ru
Rússia, Moscow

Yu. Syrov

Moscow Technological University (Institute of Fine Chemical Technologies)

Email: anavenko@yandex.ru
Rússia, Moscow

T. Sorokin

Moscow Technological University (Institute of Fine Chemical Technologies)

Email: anavenko@yandex.ru
Rússia, Moscow

V. Shvets

Moscow Technological University (Institute of Fine Chemical Technologies)

Email: anavenko@yandex.ru
Rússia, Moscow

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