Radiation Stability of Copper Films under Irradiation with He2+ Ions

Abstract

The effect of irradiation of copper films with low-energy He²⁺ ions on their structural properties has been studied. The surface morphology and structural properties of the samples before and after irradiation have been examined by scanning electron microscopy, energy dispersive analysis, and X-ray diffraction. Bombardment of the initial samples with He²⁺ ions at a fluence of 1 × 10¹⁶ion/cm² alters the surface morphology of copper films and leads to the formation of nanoscale inclusions of hexagonal shape. An increase in the fluence to 1 × 10¹⁷ ion/cm² and higher results in the formation of cracks and amorphous oxide inclusions on the sample surface.