Optical and electrical properties of thin NiO films deposited by reactive magnetron sputtering and spray pyrolysis

H. P. Parkhomenko; M. N. Solovan; A. I. Mostovoi; I. G. Orletskii; O. A. Parfenyuk; P. D. Maryanchuk

doi:10.1134/S0030400X17060145

Optical and electrical properties of thin NiO films deposited by reactive magnetron sputtering and spray pyrolysis

Authors: Parkhomenko H.P.¹, Solovan M.N.¹, Mostovoi A.I.¹, Orletskii I.G.¹, Parfenyuk O.A.¹, Maryanchuk P.D.¹
Affiliations:
1. Fedkovich Chernivtsi National University
Issue: Vol 122, No 6 (2017)
Pages: 944-948
Section: Condensed-Matter Spectroscopy
URL: https://journal-vniispk.ru/0030-400X/article/view/165417
DOI: https://doi.org/10.1134/S0030400X17060145
ID: 165417

Cite item

Full Text

Open Access
Restricted Access

Access granted
Restricted Access

Subscription Access

Abstract
About the authors
References
Supplementary files
Statistics

Abstract

Thin NiO films are deposited by reactive magnetron sputtering and spray pyrolysis. The main optical constants, i.e., refractive index n(λ), absorption coefficient α(λ), extinction coefficient k(λ), and thickness d, are determined. The temperature dependence of the resistance of thin films is found, and the activation energy of films deposited by different methods is determined.