Thermal stability of the microstructure of silver films

Аннотация

The thermal stability of freely suspended silver films 100 nm thick is studied during isothermal annealing at temperatures of 350–600°C for different times. At temperatures of 350–450°C, only grain growth is observed. Above 450°C, along with grain growth, the formation and growth of hillocks and holes take place; in this case, grain boundaries are essential in the processes. A continuous film transforms into a cellular one. At 500°C, the growth processes of both grains and holes have the same incubation period, during which no grain growth, hole formation, and hole growth take place.