Email this article Multibeam X-ray lithography to form deep regular microstructures
- Authors: Goldenberg B.G.1, Lemzyakov A.G.1, Zelinsky A.G.2, Nazmov V.P.1, Pindyurin V.F.1
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Affiliations:
- Budker Institute of Nuclear Physics
- Institute of Solid State Chemistry and Mechanochemistry
- Issue: Vol 10, No 1 (2016)
- Pages: 92-95
- Section: Article
- URL: https://journal-vniispk.ru/1027-4510/article/view/187903
- DOI: https://doi.org/10.1134/S1027451016010134
- ID: 187903
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Abstract
A method for the fabrication of regular microstructures with a high aspect ratio (for example, X-ray gratings) by direct multibeam vector recording in layers of an SU-8 resist is presented. An X-ray beam with a wavelength from 0.4 to 1.7 Å is used for recording. The features of the method are described. The fabricated samples of regular microstructures of the SU-8 resist and gold-plated X-ray masks are presented as finished products.
About the authors
B. G. Goldenberg
Budker Institute of Nuclear Physics
Author for correspondence.
Email: goldenberg@inp.nsk.su
Russian Federation, Novosibirsk, 630090
A. G. Lemzyakov
Budker Institute of Nuclear Physics
Email: goldenberg@inp.nsk.su
Russian Federation, Novosibirsk, 630090
A. G. Zelinsky
Institute of Solid State Chemistry and Mechanochemistry
Email: goldenberg@inp.nsk.su
Russian Federation, Novosibirsk, 630128
V. P. Nazmov
Budker Institute of Nuclear Physics
Email: goldenberg@inp.nsk.su
Russian Federation, Novosibirsk, 630090
V. F. Pindyurin
Budker Institute of Nuclear Physics
Email: goldenberg@inp.nsk.su
Russian Federation, Novosibirsk, 630090
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