Morphology of anodic alumina films obtained by hard anodization: Influence of the rate of anodization voltage increase
- Authors: Roslyakov I.V.1,2,3, Kuratova N.S.1, Koshkodaev D.S.4, Merino D.H.5, Lukashin A.V.1,2,3, Napolskii K.S.1,2,3
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Affiliations:
- Department of Materials Science
- Department of Chemistry
- Foundation “National Intellectual Development”
- National Research University of Electronic Technology
- DUBBLE CRG ESRF BM26
- Issue: Vol 10, No 1 (2016)
- Pages: 191-197
- Section: Article
- URL: https://journal-vniispk.ru/1027-4510/article/view/188051
- DOI: https://doi.org/10.1134/S1027451016010298
- ID: 188051
Cite item
Abstract
The influence of the anodization voltage ramp on the morphology and thickness homogeneity of porous anodic alumina films was studied. The samples were prepared in the oxalic acid at 120 V during the hard anodization process. As a nondestructive characterization method, the smallangle Xray scattering technique was used. The analysis of diffraction patterns allows determining the mean value and dispersion of interpore distance and the channel tortuosity with high accuracy. The increase of voltage ramp at the initial stage of hard anodization process was shown to lead to reduction of mechanical deformation (tortuosity) of anodic alumina film during crystallization.
About the authors
I. V. Roslyakov
Department of Materials Science; Department of Chemistry; Foundation “National Intellectual Development”
Author for correspondence.
Email: ilya.roslyakov@gmail.ru
Russian Federation, Moscow, 119991; Moscow, 119991; Moscow, 119991
N. S. Kuratova
Department of Materials Science
Email: ilya.roslyakov@gmail.ru
Russian Federation, Moscow, 119991
D. S. Koshkodaev
National Research University of Electronic Technology
Email: ilya.roslyakov@gmail.ru
Russian Federation, Zelenograd, Moscow, 124498
D. Hermida Merino
DUBBLE CRG ESRF BM26
Email: ilya.roslyakov@gmail.ru
France, Grenoble Cedex, F-38043
A. V. Lukashin
Department of Materials Science; Department of Chemistry; Foundation “National Intellectual Development”
Email: ilya.roslyakov@gmail.ru
Russian Federation, Moscow, 119991; Moscow, 119991; Moscow, 119991
K. S. Napolskii
Department of Materials Science; Department of Chemistry; Foundation “National Intellectual Development”
Email: ilya.roslyakov@gmail.ru
Russian Federation, Moscow, 119991; Moscow, 119991; Moscow, 119991
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