Effect of bias potential on the structure and distribution of elements in titanium-nitride coatings obtained by cathodic-arc deposition

E. B. Kashkarov; N. N. Nikitenkov; M. S. Syrtanov; A. N. Sutygina; D. V. Gvozdyakov

doi:10.1134/S1027451016030265

Effect of bias potential on the structure and distribution of elements in titanium-nitride coatings obtained by cathodic-arc deposition

Authors: Kashkarov E.B.¹, Nikitenkov N.N.¹, Syrtanov M.S.¹, Sutygina A.N.¹, Gvozdyakov D.V.¹
Affiliations:
1. National Research Tomsk Polytechnic University
Issue: Vol 10, No 3 (2016)
Pages: 648-651
Section: Article
URL: https://journal-vniispk.ru/1027-4510/article/view/189103
DOI: https://doi.org/10.1134/S1027451016030265
ID: 189103

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Abstract

It is shown that a change in the pulsed bias potential in the process of the cathodic-arc deposition of titanium nitride has a significant effect on the structure and composition of coatings, as well as on the quantity of the microdroplet fraction. A bias potential of above 50 V leads to a decrease in the coating growth rate, which is related to resputtering of the coating by ions accelerated from the plasma.