The effect of bombardment with neutralized neon ions on the roughness of a fused silica and beryllium surface

Abstract

The effect of Ne ion beam etching on the roughness of materials for optical substrates—fused silica and beryllium—is studied. It is shown that the treatment of a fused silica surface by neutralized Ne ions with an energy of 400–800 eV makes it possible to smooth roughnessed in the range of higher spatial frequencies of 3–63 μm^–1 at an incidence angle of 0°–30°. For beryllium, the possibility of smoothing the surface roughness at an ion energy of 400 eV is found.