Fabrication of quasi-optical selective elements for the terahertz range in the form of pseudometallic structures via deep X-ray lithography

Abstract

A technique for fabricating self-bearing pseudometallic structures, which hold promise for utilization as quasi-optical frequency-selective elements in the terahertz range of the electromagnetic spectrum, is discussed. The technique is based on microstructuring a continuous dielectric layer via stencilled X-ray lithography involving synchrotron radiation with subsequent metallization of the entire structure surface. The main manufacturing schemes are described, including fabrication of the initial substrates and X-ray masks. Examples of samples of the produced selective elements, such as frequency filters and flat lenses, as well as their operating characteristics, are presented.