Depth Distribution of Residual Fluorine in a Polyvinylidene Fluoride Film under Electron Bombardment

Abstract

The influence of the initial energy of electrons on the kinetics of the defluorination of the surface of a polyvinylidene fluoride film (PVDF) under electron bombardment is studied. The kinetic equation of the third order describes this process for any electron energy. The minimum possible fluorine content in the near-surface layer of the PVDF film exposed to long-duration bombardment is determined. The depth of penetration of electrons into the sample, i.e. the free path of bombarding electrons with different initial energies, is calculated. The nonmonotonic depth distribution of residual fluorine in the film, which to a great extent depends on the electron energy, is revealed.