Vanadium- and Titanium Dioxide-Based Memristors Fabricated via Pulsed Laser Deposition


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Abstract

Thin TiOx and VO2 – x films are fabricated via pulsed laser deposition from metal targets with the help of mask technologies. Their memristive properties are investigated using Au/TiOx1/TiOx2/Au and Au/VO2/VO2 – x/Au thin-film structures, and the possible mechanisms of resistive switching are discussed. The structures are obtained at room temperature in an oxygen atmosphere.

About the authors

O. A. Novodvorsky

Institute of Laser and Information Technologies, Federal Scientific Research Centre “Crystallography and Photonics”

Author for correspondence.
Email: onov@mail.ru
Russian Federation, Shatura, 140700

L. S. Parshina

Institute of Laser and Information Technologies, Federal Scientific Research Centre “Crystallography and Photonics”

Email: onov@mail.ru
Russian Federation, Shatura, 140700

A. A. Lotin

Institute of Laser and Information Technologies, Federal Scientific Research Centre “Crystallography and Photonics”

Email: onov@mail.ru
Russian Federation, Shatura, 140700

V. A. Mikhalevsky

Institute of Laser and Information Technologies, Federal Scientific Research Centre “Crystallography and Photonics”

Email: onov@mail.ru
Russian Federation, Shatura, 140700

O. D. Khramova

Institute of Laser and Information Technologies, Federal Scientific Research Centre “Crystallography and Photonics”

Email: onov@mail.ru
Russian Federation, Shatura, 140700

E. A. Cherebylo

Institute of Laser and Information Technologies, Federal Scientific Research Centre “Crystallography and Photonics”

Email: onov@mail.ru
Russian Federation, Shatura, 140700

V. Ya. Panchenko

Institute of Laser and Information Technologies, Federal Scientific Research Centre “Crystallography and Photonics”

Email: onov@mail.ru
Russian Federation, Shatura, 140700

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