Microstructure and Density of Mo Films in Multilayer Mo/Si Mirrors

Abstract

Using the wide-angle and small-angle X-ray diffraction techniques, the Mo density is obtained as a function of the layer thickness in periodic X-ray Mo/Si mirrors synthesized by magnetron sputtering in an argon atmosphere. By the example of a simulated aperiodic multilayer Mo/Si mirror, the necessity to take into account the real density of Mo and the incorrect use of its tabulated densities is demonstrated.