Investigation of parameters of inductively coupled plasma and its use in steel nitriding

Толық мәтін

Ашық рұқсат Ашық рұқсат
Рұқсат жабық Рұқсат берілді
Рұқсат жабық Тек жазылушылар үшін

Аннотация

Parameters of inductively coupled plasma (ICP) discharges in a mixture of gases N2, H2, and Ar at a total pressure of 1.5 × 10–3 mbar and a partial pressure ratio N2: H2: Ar = 2: 12: 1 are discussed. The plasma properties are analyzed using Langmuir probes and optical emission spectroscopy. The ICP discharge is used for the nitriding of specimens made of Russian grade 30ChGSA structural steel. The nitriding experiments are performed at different bias voltages Vb in the range of–200 V to +100 V with respect to the walls of the discharge chamber. The surface hardness of the treated specimens depends substantially on the bias voltage, being much higher than the initial value in all cases. The obtained results demonstrate the possibility of increasing the surface hardness up to 1000 HV (4–5 times the initial values) at the bias voltage equal to the floating potential.

Авторлар туралы

E. Meshcheryakova

National Research Nuclear University

Хат алмасуға жауапты Автор.
Email: meshchkate@mephist.ru
Ресей, Moscow, 115409

A. Kaziev

National Research Nuclear University

Email: meshchkate@mephist.ru
Ресей, Moscow, 115409

M. Zibrov

National Research Nuclear University

Email: meshchkate@mephist.ru
Ресей, Moscow, 115409

T. Stepanova

National Research Nuclear University

Email: meshchkate@mephist.ru
Ресей, Moscow, 115409

M. Berdnikova

National Research Nuclear University

Email: meshchkate@mephist.ru
Ресей, Moscow, 115409

M. Kharkov

National Research Nuclear University

Email: meshchkate@mephist.ru
Ресей, Moscow, 115409

A. Pisarev

National Research Nuclear University

Email: meshchkate@mephist.ru
Ресей, Moscow, 115409

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