Features of Wavelet Analysis in X-Ray Reflectometry of Thin Films
- Authors: Astaf’ev S.B.1, Yanusova L.G.1
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Affiliations:
- Shubnikov Institute of Crystallography, Federal Scientific Research Centre “Crystallography and Photonics,”
- Issue: Vol 63, No 5 (2018)
- Pages: 791-795
- Section: Surface and Thin Films
- URL: https://journal-vniispk.ru/1063-7745/article/view/192974
- DOI: https://doi.org/10.1134/S1063774518050036
- ID: 192974
Cite item
Abstract
Specific features of the use of wavelet transform for estimating the thickness of layers and their order in a film density profile based on X-ray and synchrotron reflectometry data are considered. Some ways are proposed to reveal the characteristic features of Langmuir film packing by constructing a wavelet transform for the corresponding reflectograms. Dependences of the X-ray attenuation length on the grazing incidence angle are plotted by an example of multilayered box model of film profile; these dependences demonstrate possibilities of mapping the spatial signal delay (which occurs when rays are reflected from layers of different density) in a waveletgram.
About the authors
S. B. Astaf’ev
Shubnikov Institute of Crystallography, Federal Scientific Research Centre “Crystallography and Photonics,”
Author for correspondence.
Email: bard@crys.ras.ru
Russian Federation, Moscow, 119333
L. G. Yanusova
Shubnikov Institute of Crystallography, Federal Scientific Research Centre “Crystallography and Photonics,”
Email: bard@crys.ras.ru
Russian Federation, Moscow, 119333
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