Planarization of a surface of nanoporous silica–titania composition by atomic-molecular chemical assembly

Abstract

The processes involved in the planarization of the surface of nanoporous SiO₂ by the atomicmolecular deposition of nanoscale TiO₂ films were studied in regimes with different degrees of penetration of TiO₂ into SiO₂ nanopores. The technological process parameters that correspond to different regimes of surface planarization were examined. The degree of penetration of TiO₂ into SiO₂ nanopores was monitored using reflection ellipsometry by measuring the depth distribution of the refraction index within the two-layer model.