Magnetization Distribution in Particles with Configuration Anisotropy, Prepared via Microsphere Lithography

Abstract

The arrays of permalloy particles with shape anisotropy, prepared via microsphere lithography, have been characterized using atomic force microscopy and magnetic force microscopy. The size effect from spherical particles used as the lithographic mask on the magnetization distribution in the produced particles has been investigated. The magnetic force images of particles have been simulated in order to obtain quantitative values. A comparison of shape reproducibility of particles prepared using microsphere lithography and scanning probe lithography is performed as well.