Email this article Adhesion at the Ta(Mo)/NiTi Interface
- Authors: Bakulin A.V.1,2, Kulkova S.E.1,2
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Affiliations:
- Institute of Strength Physics and Materials Science, Siberian Branch, Russian Academy of Sciences
- National Research Tomsk State University
- Issue: Vol 45, No 6 (2019)
- Pages: 620-624
- Section: Article
- URL: https://journal-vniispk.ru/1063-7850/article/view/208348
- DOI: https://doi.org/10.1134/S1063785019060208
- ID: 208348
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Abstract
The atomic and electronic structures of Me(110)/NiTi(110) and TiO2(100)/Me(110) interfaces (where Me = Ta, Mo) have been studied by the projector augmented-wave method in the framework of the density functional theory. It is established that the formation of intermediate oxide layers at the metal–oxide interface can lead to decreased adhesion at the interface.
About the authors
A. V. Bakulin
Institute of Strength Physics and Materials Science, Siberian Branch, Russian Academy of Sciences; National Research Tomsk State University
Author for correspondence.
Email: bakulin@ispms.tsc.ru
Russian Federation, Tomsk, 634055; Tomsk, 634050
S. E. Kulkova
Institute of Strength Physics and Materials Science, Siberian Branch, Russian Academy of Sciences; National Research Tomsk State University
Email: bakulin@ispms.tsc.ru
Russian Federation, Tomsk, 634055; Tomsk, 634050
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