Elastic Scattering of Neutral Fluorine on Si, O, C, and H Atoms in the Range of the Relative Kinetic Energies of 2–200 eV
- 作者: Palov A.1, Zhang J.2, Baklanov M.2, Wei S.2
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隶属关系:
- Skobeltsyn Institute of Nuclear Physics, Lomonosov Moscow State University
- Institute of Electronic Information Engineering, North China University of Technology
- 期: 卷 45, 编号 12 (2019)
- 页面: 1187-1190
- 栏目: Article
- URL: https://journal-vniispk.ru/1063-7850/article/view/208497
- DOI: https://doi.org/10.1134/S1063785019120113
- ID: 208497
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详细
Binary interatomic potentials F–F, F–Si, F–O, F–C, and F–H are calculated from the first principles (ab initio) on the basis of the multi-configuration method of self-consistent field (CAS-SCF) with a basic set of atomic wave functions aug-pp-AV6Z and are used to calculate phase shifts and cross sections of elastic scattering of atoms in the range of relative kinetic energies of 2–200 eV. It is expected that the obtained elastic scattering cross sections will be useful for a description of sputtering and etching of porous organosilicate films with ethylene bridges used in modern nanoelectronics.
作者简介
A. Palov
Skobeltsyn Institute of Nuclear Physics, Lomonosov Moscow State University
编辑信件的主要联系方式.
Email: a.palov@mail.ru
俄罗斯联邦, Moscow, 119991
Jing Zhang
Institute of Electronic Information Engineering, North China University of Technology
Email: weishuhua@ncut.edu.cn
中国, Beijing
M. Baklanov
Institute of Electronic Information Engineering, North China University of Technology
Email: weishuhua@ncut.edu.cn
中国, Beijing
Shuhua Wei
Institute of Electronic Information Engineering, North China University of Technology
编辑信件的主要联系方式.
Email: weishuhua@ncut.edu.cn
中国, Beijing
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