Email this article The Influence of High-Frequency Discharge on Substrate Temperature during Film Deposition
- Authors: Shirokov V.B.1,2, Zinchenko S.P.1,2
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Affiliations:
- Southern Research Center, Russian Academy of Sciences
- Southern Federal University
- Issue: Vol 45, No 5 (2019)
- Pages: 478-480
- Section: Article
- URL: https://journal-vniispk.ru/1063-7850/article/view/208310
- DOI: https://doi.org/10.1134/S1063785019050316
- ID: 208310
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Abstract
The process of discharge-induced substrate heating at the initial stage of film synthesis by method of high-frequency cathode sputter deposition has been studied. The temperature to which the substrate was heated after the discharge switch-on was determined using the optical interferometry technique. In a working regime of barium strontium titanate film deposition onto a magnesium oxide substrate, the substrate temperature exceeded 1000°C.
About the authors
V. B. Shirokov
Southern Research Center, Russian Academy of Sciences; Southern Federal University
Author for correspondence.
Email: shirokov-vb@rambler.ru
Russian Federation, Rostov-on-Don, 344006; Rostov-on-Don, 344006
S. P. Zinchenko
Southern Research Center, Russian Academy of Sciences; Southern Federal University
Email: shirokov-vb@rambler.ru
Russian Federation, Rostov-on-Don, 344006; Rostov-on-Don, 344006
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