Formation of ordered nano- and mesostructures in silicon irradiated with a single femtosecond laser pulse in different environments
- Авторлар: Romashevskiy S.A.1,2, Ashitkov S.I.1, Dmitriev A.S.2
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Мекемелер:
- Joint Institute for High Temperatures
- National Research University “Moscow Power Engineering Institute,”
- Шығарылым: Том 42, № 8 (2016)
- Беттер: 810-813
- Бөлім: Article
- URL: https://journal-vniispk.ru/1063-7850/article/view/200431
- DOI: https://doi.org/10.1134/S1063785016080150
- ID: 200431
Дәйексөз келтіру
Аннотация
We report on a new class of ordered nano- and mesostructures, including distinct structured areas with subnanoscale roughness, produced by interaction of single tightly focused femtosecond laser pulses with a monocrystalline silicon surface under different environments. The environment was found to have a significant effect on the final morphology of near-surface layers of silicon.
Авторлар туралы
S. Romashevskiy
Joint Institute for High Temperatures; National Research University “Moscow Power Engineering Institute,”
Хат алмасуға жауапты Автор.
Email: sa.romashevskiy@gmail.com
Ресей, Moscow, 125412; Moscow, 111250
S. Ashitkov
Joint Institute for High Temperatures
Email: sa.romashevskiy@gmail.com
Ресей, Moscow, 125412
A. Dmitriev
National Research University “Moscow Power Engineering Institute,”
Email: sa.romashevskiy@gmail.com
Ресей, Moscow, 111250
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