Enviar artigo por via de e-mail Target cleaning for faster CrN/AlN coating growth in magnetron sputtering
- Autores: Bukarev I.M.1, Sobol’kov A.V.1, Aborkin A.V.1
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Afiliações:
- Stoletov Vladimir State University
- Edição: Volume 37, Nº 6 (2017)
- Páginas: 502-504
- Seção: Article
- URL: https://journal-vniispk.ru/1068-798X/article/view/227318
- DOI: https://doi.org/10.3103/S1068798X17060090
- ID: 227318
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Resumo
Metallic sputtering may be used to clean the target surface in the course of coating application by reactive magnetron sputtering. The introduction of additional stages of metallic sputtering in reactive magnetron sputtering increases the growth rate of CrN/AlN coatings by around 23%, with little change in physicomechanical properties.
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Sobre autores
I. Bukarev
Stoletov Vladimir State University
Email: aborkin@vlsu.ru
Rússia, Vladimir
A. Sobol’kov
Stoletov Vladimir State University
Email: aborkin@vlsu.ru
Rússia, Vladimir
A. Aborkin
Stoletov Vladimir State University
Autor responsável pela correspondência
Email: aborkin@vlsu.ru
Rússia, Vladimir
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