Corrosion resistance of nanostructured films of titanium diboride in mineral acid solutions

Abstract

The reactions of nanostructured TiB₂ films (mean grain size is 3.3 ± 1.1 nm) with mineral acids (HCl, H₂SO₄, H₃PO₄, and HNO₃) of different concentrations have been studied. It is found that the dissolution of the films is a congruent process showing linear kinetics for the time periods in the range from 300 to 1500 min. The corrosion depth parameters of nanostructured TiB₂ films in mineral acids are determined, and their corrosion resistance is graded on a ten-point scale. The studied films show the lowest corrosion resistance in their reaction with nitric acid solutions, and the highest resistance is observed in phosphoric acid solutions.