Estimation of the thickness of graphite nanofilm on a silicon substrate by using energy dispersive X-ray analysis data

Abstract

Energy-dispersive X-ray spectroscopy is applied to analyze composition and thickness of graphite nanofilm on a substrate. We estimate the thickness of graphite nanofilm on a silicon substrate using a simple equation proposed in this work. The equation is based on data of the energy-dispersive microanalysis and not contains fitting parameters. The condition of applicability of the formula is a low value of the electron acceleration voltage at which the depth of electron beam penetration not exceeds a silicon oxide layer thickness. The number of graphite nanofilm layers estimated from the calculated thickness is reasonably confirmed by Raman spectroscopy data. It is shown, that the number of graphite nanofilm layers can be determined by carbon atomic content in at %.