Enviar artigo por via de e-mail Development of a Kinetic Model for the Direct Oxidation of Benzene to Phenol by Oxygen in Dielectric Barrier Discharge
- Autores: Ochered’ko A.N.1, Leshchik A.V.1, Kudryashov S.V.1, Ryabov A.Y.1
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Afiliações:
- Institute of Petroleum Chemistry, Siberian Branch, Russian Academy of Sciences
- Edição: Volume 57, Nº 5 (2023)
- Páginas: 396-399
- Seção: PLASMA CHEMISTRY
- URL: https://journal-vniispk.ru/0023-1193/article/view/140011
- DOI: https://doi.org/10.31857/S002311932305008X
- EDN: https://elibrary.ru/MYBAOH
- ID: 140011
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Resumo
A simplified model of the process of benzene oxidation by oxygen in a dielectric barrier discharge has been developed. A kinetic scheme of oxidation is proposed that reflects the real chemistry of the process. The simulation results confirm the earlier assumptions about the main stages of the benzene oxidation process with oxygen.
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Sobre autores
A. Ochered’ko
Institute of Petroleum Chemistry, Siberian Branch, Russian Academy of Sciences
Email: andrew@ipc.tsc.ru
Tomsk, 634055 Russia
A. Leshchik
Institute of Petroleum Chemistry, Siberian Branch, Russian Academy of Sciences
Email: andrew@ipc.tsc.ru
Tomsk, 634055 Russia
S. Kudryashov
Institute of Petroleum Chemistry, Siberian Branch, Russian Academy of Sciences
Email: andrew@ipc.tsc.ru
Tomsk, 634055 Russia
A. Ryabov
Institute of Petroleum Chemistry, Siberian Branch, Russian Academy of Sciences
Autor responsável pela correspondência
Email: andrew@ipc.tsc.ru
Tomsk, 634055 Russia
Bibliografia
- Fridman A. Plasma chemistry. New York: Cambridge University Press, 2012. 978 p.
- Самойлович В.Г., Гибалов В.И., Козлов К.В. Физическая химия барьерного разряда. Москва: МГУ, 1989. 174 с.
- Kogelschatz U. // Plasma Chem. Plasma P. 2003. V. 23. № 1. P. 1.
- Кудряшов С.В., Рябов А.Ю., Сироткина Е.Е. и др. // Химия высоких энергий. 2003. Т. 37. № 3. С. 220.
- Kudryashov S., Ryabov A., Shchyogoleva G. // J. Phys. D. Appl. Phys. 2016. V. 49. P. 025205.
- Ochered’ko A.N., Kudryashov S.V., Ryabov A.Yu., et al. // High Energ. Chem. 2022. V. 56. № 4. P. 284.
- Kraus M., Egli W., Haffner K., et al. // Phys. Chem. Chem. Phys. 2002. V. 4. № 4. P. 668.
- Lovascio S., Blin-Simiand N., Magne L., et al. // Plasma Chem. Plasma P. 2015. V. 35. № 2. P. 279–301.
- Istadi I., Amin N.A.S. // Chem. Eng. Sci. 2007. V. 62. № 23. P. 6568.
- Yang Y. // Plasma Chem. Plasma P. 2003. V. 23. № 2. P. 283.
- Non-thermal plasma techniques for pollution control / ed. Penetrante B.M., Schultheis S.E. Berlin, Heidelberg: Springer Berlin Heidelberg, 1993. 421 p.
- Viehland database. URL: http://www.lxcat.net (дата обращения 25.04.2023).
- Bugaev S.P., Kozyrev A.V., Kuvshinov V.A., et al. // Plasma chem. Plasma P. 1998. V. 18. № 2. P. 247.
- Kovács T. // Plasma Ñhem. Plasma P. 2009. V. 30. № 1. P. 207.
- Hagelaar G.J.M., Pitchford L.C. // Plasma Sources Sci. T. 2005. V. 14. № 4. P. 722.
- Kintecus. URL: www.kintecus.org. (дата обращения: 25.04.2023).
- Taatjes C.A., Osborn D. L., Selby T.M., et al. // J. Phys. Chem. A. 2010. V. 114. № 9. P. 3355.
- Tanaka K., Ando M., Sakamoto Y., et al. // Int. J. Chem. Kinet. 2012. V. 44. P. 41.
- Atkinson R., Baulch D.L., Cox R.A., et al. // Atmos. Chem. Phys. 2004. V. 4. № 6. P. 1461.
- Turányi T., Nagy T., Zsély I.G., et al. // Int. J. Chem. Kinet. 2012. V. 44. № 5. P. 284.
- Atkinson R., Baulch D.L., Cox R.A., et al. // J. Phys. Chem. Ref. Data. 1989. V. 18. № 2. P. 881.
