Surface Polaritons in Silicon-Doped Aluminum and Gallium Nitride Films
- Autores: Novikova N.N.1, Yakovlev V.A.1, Klimin S.A.1, Malin T.V.2, Gilinsky A.M.2, Zhuravlev K.S.2,3
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Afiliações:
- Institute of Spectroscopy, Russian Academy of Sciences
- Rzhanov Institute of Semiconductor Physics, Siberian Branch of Russian Academy of Sciences
- Novosibirsk State University
- Edição: Volume 127, Nº 1 (2019)
- Páginas: 36-39
- Seção: Spectroscopy of Condensed States
- URL: https://journal-vniispk.ru/0030-400X/article/view/166033
- DOI: https://doi.org/10.1134/S0030400X19070208
- ID: 166033
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Resumo
The reflection and attenuated total reflection spectra of aluminum and gallium nitride films doped with silicon on sapphire substrates with a buffer layer of aluminum nitride have been measured. In the spectra of attenuated total reflection, surface phonon and plasmon–phonon polaritons were observed. A high concentration of charge carriers in the gallium nitride film and their practical absence in the aluminum nitride film were experimentally observed.
Sobre autores
N. Novikova
Institute of Spectroscopy, Russian Academy of Sciences
Email: klimin@isan.troitsk.ru
Rússia, MoscowTroitsk, 108840
V. Yakovlev
Institute of Spectroscopy, Russian Academy of Sciences
Email: klimin@isan.troitsk.ru
Rússia, MoscowTroitsk, 108840
S. Klimin
Institute of Spectroscopy, Russian Academy of Sciences
Autor responsável pela correspondência
Email: klimin@isan.troitsk.ru
Rússia, MoscowTroitsk, 108840
T. Malin
Rzhanov Institute of Semiconductor Physics, Siberian Branch of Russian Academy of Sciences
Email: klimin@isan.troitsk.ru
Rússia, Novosibirsk, 630090
A. Gilinsky
Rzhanov Institute of Semiconductor Physics, Siberian Branch of Russian Academy of Sciences
Email: klimin@isan.troitsk.ru
Rússia, Novosibirsk, 630090
K. Zhuravlev
Rzhanov Institute of Semiconductor Physics, Siberian Branch of Russian Academy of Sciences; Novosibirsk State University
Email: klimin@isan.troitsk.ru
Rússia, Novosibirsk, 630090; Novosibirsk, 630090
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