Email this article Visualization of Defects on the Semiconductor Surface Using a Dielectric Barrier Discharge
- Authors: Sitanov D.V.1, Pivovarenok S.A.1
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Affiliations:
- Ivanovo State University of Chemistry and Technology
- Issue: Vol 47, No 1 (2018)
- Pages: 34-39
- Section: Article
- URL: https://journal-vniispk.ru/1063-7397/article/view/186776
- DOI: https://doi.org/10.1134/S1063739718010067
- ID: 186776
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Abstract
It is demonstrated that plasma techniques can be used to detect various defects on a solid surface by a self-sustained discharge under atmospheric pressure. Special attention is paid to controlling surface defects and the end cleavages of semiconducting wafers and pinholes of layered structures.
About the authors
D. V. Sitanov
Ivanovo State University of Chemistry and Technology
Author for correspondence.
Email: sitanov@isuct.ru
Russian Federation, Ivanovo, 153000
S. A. Pivovarenok
Ivanovo State University of Chemistry and Technology
Email: sitanov@isuct.ru
Russian Federation, Ivanovo, 153000
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