作者的详细信息

Mikoushkin, V. M.

栏目 标题 文件
卷 52, 编号 5 (2018) XXV International Symposium “Nanostructures: Physics and Technology”, Saint Petersburg, Russia, June 26–30, 2017. Nanostructure Characterization Composition and Band Structure of the Native Oxide Nanolayer on the Ion Beam Treated Surface of the GaAs Wafer
卷 52, 编号 16 (2018) 26th INTERNATIONAL SYMPOSIUM “NANOSTRUCTURES: PHYSICS AND TECHNOLOGY”. NANOSTRUCTURE CHARACTERIZATION Сomposition Depth Profiling of the GaAs Native Oxide Irradiated by an Ar+ Ion Beam
卷 52, 编号 16 (2018) 26th INTERNATIONAL SYMPOSIUM “NANOSTRUCTURES: PHYSICS AND TECHNOLOGY”. NANOSTRUCTURE CHARACTERIZATION In situ Bandgap Determination of the GaAsN Nanolayer Prepared by Low-Energy \({\text{N}}_{2}^{ + }\)Ion Implantation
卷 53, 编号 4 (2019) Nonelectronic Properties of Semiconductors (Atomic Structure, Diffusion) Defect Formation under Nitrogen-Ion Implantation and Subsequent Annealing in GaAs Structures with an Uncovered Surface and a Surface Covered with an AlN Film
卷 53, 编号 14 (2019) Nanostructures Characterization Arsenic Diffusion in the Natural Oxidation of the Heavily Defected GaAs Surface
卷 53, 编号 14 (2019) Nanostructures Characterization JV Characteristic of pn Structure Formed on n-GaAs Surface by Ar+ Ion Beam