Автор туралы ақпарат

Shchukin, V. G.

Шығарылым Бөлім Атауы Файл
Том 53, № 1 (2019) Fabrication, Treatment, and Testing of Materials and Structures Deposition of Silicon Films Doped with Boron and Phosphorus by the Gas-Jet Plasma-Chemical Method
Том 53, № 12 (2019) Fabrication, Treatment, and Testing of Materials and Structures Deposition of Amorphous and Microcrystalline Films of Silicon by the Gas-Jet Plasma-Chemical Method