Transport of hot charge carriers in Si, GaAs, InGaAs, and GaN submicrometer semiconductor structures with nanometer-scale clusters of radiation-induced defects


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Resumo

The distributions of the radii of subclusters of radiation-induced defects and of the distances between the cores of these subclusters are calculated for Si, GaAs, and GaN. The features of the transport of hot charge carriers in the above materials upon irradiation with neutrons are discussed. A burst in the velocity of electrons in Si, GaAs, InGaAs, and GaN before and after irradiation is calculated for the first time; also, the extent of manifestation of the above effect in different semiconductor materials is compared.

Sobre autores

I. Zabavichev

Lobachevsky State University of Nizhny Novgorod

Email: obolensk@rf.unn.ru
Rússia, Nizhny Novgorod, 603950

E. Obolenskaya

Lobachevsky State University of Nizhny Novgorod

Email: obolensk@rf.unn.ru
Rússia, Nizhny Novgorod, 603950

A. Potekhin

Lobachevsky State University of Nizhny Novgorod

Email: obolensk@rf.unn.ru
Rússia, Nizhny Novgorod, 603950

A. Puzanov

Lobachevsky State University of Nizhny Novgorod

Email: obolensk@rf.unn.ru
Rússia, Nizhny Novgorod, 603950

S. Obolensky

Lobachevsky State University of Nizhny Novgorod

Autor responsável pela correspondência
Email: obolensk@rf.unn.ru
Rússia, Nizhny Novgorod, 603950

V. Kozlov

Lobachevsky State University of Nizhny Novgorod; Institute for Physics of Microstructures

Email: obolensk@rf.unn.ru
Rússia, Nizhny Novgorod, 603950; Nizhny Novgorod, 607680

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