Simulation of Electron and Hole States in Si Nanocrystals in a SiO2 Matrix: Choice of Parameters of the Empirical Tight-Binding Method
- Autores: Belolipetskiy A.V.1, Nestoklon M.O.1, Yassievich I.N.1
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Afiliações:
- Ioffe Institute
- Edição: Volume 52, Nº 10 (2018)
- Páginas: 1264-1268
- Seção: Microcrystalline, Nanocrystalline, Porous, and Composite Semiconductors
- URL: https://journal-vniispk.ru/1063-7826/article/view/204132
- DOI: https://doi.org/10.1134/S1063782618100020
- ID: 204132
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Resumo
The problem of the optimal choice of parameters of the empirical tight-binding method to simulate the quantum-confined levels of Si nanocrystals embedded into an amorphous SiO2 matrix is studied. To account for tunneling from nanocrystals to SiO2, the amorphous matrix is considered as a virtual crystal with a band structure similar to that of SiO2 β-cristobalite and with a lattice constant matched to the lattice constant of bulk Si. The electron density distributions in k space for electrons and holes quantum-confined in a Si nanocrystal in SiO2 are calculated in a wide energy region, which provides a means to see clearly the possibility of the existence of efficient direct optical transitions for hot electrons at the upper quantum-confined levels.
Sobre autores
A. Belolipetskiy
Ioffe Institute
Autor responsável pela correspondência
Email: a_belolipetskiy@mail.ru
Rússia, St. Petersburg, 194021
M. Nestoklon
Ioffe Institute
Email: a_belolipetskiy@mail.ru
Rússia, St. Petersburg, 194021
I. Yassievich
Ioffe Institute
Email: a_belolipetskiy@mail.ru
Rússia, St. Petersburg, 194021
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