Mechanism of Singlet-Oxygen Generation on the Surface of Excited Nanoporous Silicon
- 作者: Samosvat D.M.1, Chikalova-Luzina O.P.1, Zegrya G.G.1
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隶属关系:
- Ioffe Institute
- 期: 卷 53, 编号 11 (2019)
- 页面: 1445-1456
- 栏目: Surfaces, Interfaces, and Thin Films
- URL: https://journal-vniispk.ru/1063-7826/article/view/207268
- DOI: https://doi.org/10.1134/S1063782619110162
- ID: 207268
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详细
The mechanism of singlet-oxygen generation on the surface of photoexcited nanoporous silicon has been theoretically analyzed. It is shown that the mechanism of singlet-oxygen generation is based on nonradiative energy transfer from nanoporous silicon to an oxygen molecule according to the Dexter exchange mechanism. An analytical expression is obtained, and the probability of energy transfer from nanoporous silicon to an oxygen molecule is numerically estimated. It is shown that its numerical value, on the order of ~(103–104) s–1, is in good agreement with the experimental data.
作者简介
D. Samosvat
Ioffe Institute
编辑信件的主要联系方式.
Email: samosvat@yandex.ru
俄罗斯联邦, St. Petersburg, 194021
O. Chikalova-Luzina
Ioffe Institute
编辑信件的主要联系方式.
Email: o_chikalova@mail.ru
俄罗斯联邦, St. Petersburg, 194021
G. Zegrya
Ioffe Institute
编辑信件的主要联系方式.
Email: zegrya@theory.ioffe.ru
俄罗斯联邦, St. Petersburg, 194021
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