Structure and Properties of SiOx Films Prepared by Chemical Etching of Amorphous Alloy Ribbons

Abstract

The structure and the physical properties of amorphous SiO_x films prepared by chemical etching of an iron-based amorphous ribbon alloy have been studied. The neutron diffraction and also the atomicforce and electron microscopy show that the prepared visually transparent films have amorphous structure, exhibit dielectric properties, and their morphology is similar to that of opals. The samples have been studied by differential scanning calorimetry, Raman and IR spectroscopy before and after their heat treatment. It is found that annealing of the films in air at a temperature of 1273 K leads to a change in their chemical compositions: an amorphous SiO₂ compound with inclusions of SiO₂ nanocrystals (crystobalite) forms.