The Effect of the Ion Assistance Energy on the Electrical Resistivity of Carbon Films Prepared by Pulsed Plasma Deposition in a Nitrogen Atmosphere

Abstract

Thin carbon films prepared by pulsed plasma ion-assisted deposition of graphite in an atmosphere of a mixture of argon and nitrogen are studied. The results of characteristic electron energy loss spectroscopy and electron diffraction indicate the increase in the graphite component with increasing ion assistance energy. The use of ion assistance during the film deposition makes it possible to control their resistivity by changing it from 10⁵ to 10² Ω cm.