Influence of Orientation of a Silicon Substrate with a Buffer Silicon Carbide Layer on Dielectric and Polar Properties of Aluminum Nitride Films


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Abstract

Dielectric and polar properties of aluminum nitride (AlN) thin films epitaxially grown on differently oriented silicon substrates with the p-type conduction and a buffer silicon carbide (SiC) layer and on vicinal planes are investigated. The results of studies of the polar properties by two independent methods—the dynamic pyroelectric effect and the piezoresponse force microscopy—show that the SiC buffer layer application considerably improves polar properties of the aluminum nitride thin layer.

About the authors

O. N. Sergeeva

Tver’ State University; Herzen State Pedagogical University of Russia

Author for correspondence.
Email: o_n_sergeeva@mail.ru
Russian Federation, Tver’, 170026; St. Petersburg, 191186

A. V. Solnyshkin

Tver’ State University; Herzen State Pedagogical University of Russia

Email: o_n_sergeeva@mail.ru
Russian Federation, Tver’, 170026; St. Petersburg, 191186

D. A. Kiselev

Herzen State Pedagogical University of Russia; National University of Science and Technology MISiS

Email: o_n_sergeeva@mail.ru
Russian Federation, St. Petersburg, 191186; Moscow, 119049

T. S. Il’ina

National University of Science and Technology MISiS

Email: o_n_sergeeva@mail.ru
Russian Federation, Moscow, 119049

S. A. Kukushkin

Herzen State Pedagogical University of Russia; Institute for Problems in Mechanical Engineering, Russian Academy of Sciences

Email: o_n_sergeeva@mail.ru
Russian Federation, St. Petersburg, 191186; St. Petersburg, 199178

Sh. Sh. Sharofidinov

Herzen State Pedagogical University of Russia; Ioffe Institute

Email: o_n_sergeeva@mail.ru
Russian Federation, St. Petersburg, 191186; St. Petersburg, 194021

E. Yu. Kaptelov

Herzen State Pedagogical University of Russia; Ioffe Institute

Email: o_n_sergeeva@mail.ru
Russian Federation, St. Petersburg, 191186; St. Petersburg, 194021

I. P. Pronin

Herzen State Pedagogical University of Russia; Ioffe Institute

Email: o_n_sergeeva@mail.ru
Russian Federation, St. Petersburg, 191186; St. Petersburg, 194021

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