Email this article Thermal lithography of thin films of vanadium dioxide
- Authors: Andreev V.N.1, Klimov V.A.1, Kompan M.E.1
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Affiliations:
- Ioffe Physical Technical Institute
- Issue: Vol 42, No 1 (2016)
- Pages: 19-22
- Section: Article
- URL: https://journal-vniispk.ru/1063-7850/article/view/196701
- DOI: https://doi.org/10.1134/S1063785016010028
- ID: 196701
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Abstract
A technique is proposed for making microareas with sharply different optical and electrical properties in thin films of vanadium dioxide. The technique is based on vacuum annealing of thin films, which results in a yield of oxygen from vanadium dioxide with the formation of an oxygen vacancy in it.
About the authors
V. N. Andreev
Ioffe Physical Technical Institute
Email: v.klimov@mail.ioffe.ru
Russian Federation, St. Petersburg, 194021
V. A. Klimov
Ioffe Physical Technical Institute
Author for correspondence.
Email: v.klimov@mail.ioffe.ru
Russian Federation, St. Petersburg, 194021
M. E. Kompan
Ioffe Physical Technical Institute
Email: v.klimov@mail.ioffe.ru
Russian Federation, St. Petersburg, 194021
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