Heterobarrier Varactors with Nonuniformly Doped Modulation Layers
- 作者: Maleev N.A.1, Bobrov M.A.1, Kuzmenkov A.G.2, Vasil’ev A.P.2, Kulagina M.M.1, Guseva Y.A.1, Blokhin S.A.1, Ustinov V.M.2,3
-
隶属关系:
- Ioffe Institute
- Submicron Heterostructures for Microelectronics, Research & Engineering Center, Russian Academy of Sciences
- Saint Petersburg Electrotechnical University “LETI”
- 期: 卷 45, 编号 10 (2019)
- 页面: 1063-1066
- 栏目: Article
- URL: https://journal-vniispk.ru/1063-7850/article/view/208465
- DOI: https://doi.org/10.1134/S1063785019100250
- ID: 208465
如何引用文章
详细
Optimum shape of the capacitance–voltage (C–V) characteristic is a critical parameter determining the efficiency of frequency multiplication in heterobarrier varactors (HBVs) operating in the millimeter and submillimeter frequency ranges. A numerical model for calculating the C–V characteristics and leakage currents of HBV heterostructures with arbitrary composition and doping profiles has been verified on the basis of published and original experimental data. A specially designed HBV heterostructure with three undoped InAlAs/AlAs/InAlAs barriers surrounded by nonuniformly doped n-InGaAs modulation layers has been grown by molecular beam epitaxy on InP substrate. Prototype HBVs manufactured using the proposed heterostructure demonstrated a nearly cosine shape of the C–V curve at bias voltages up to 2 V, increased overlap capacitance, and low leakage currents.
作者简介
N. Maleev
Ioffe Institute
编辑信件的主要联系方式.
Email: maleev@beam.ioffe.ru
俄罗斯联邦, St. Petersburg, 194021
M. Bobrov
Ioffe Institute
Email: maleev@beam.ioffe.ru
俄罗斯联邦, St. Petersburg, 194021
A. Kuzmenkov
Submicron Heterostructures for Microelectronics, Research & Engineering Center, Russian Academy of Sciences
Email: maleev@beam.ioffe.ru
俄罗斯联邦, St. Petersburg, 194021
A. Vasil’ev
Submicron Heterostructures for Microelectronics, Research & Engineering Center, Russian Academy of Sciences
Email: maleev@beam.ioffe.ru
俄罗斯联邦, St. Petersburg, 194021
M. Kulagina
Ioffe Institute
Email: maleev@beam.ioffe.ru
俄罗斯联邦, St. Petersburg, 194021
Yu. Guseva
Ioffe Institute
Email: maleev@beam.ioffe.ru
俄罗斯联邦, St. Petersburg, 194021
S. Blokhin
Ioffe Institute
Email: maleev@beam.ioffe.ru
俄罗斯联邦, St. Petersburg, 194021
V. Ustinov
Submicron Heterostructures for Microelectronics, Research & Engineering Center, Russian Academy of Sciences; Saint Petersburg Electrotechnical University “LETI”
Email: maleev@beam.ioffe.ru
俄罗斯联邦, St. Petersburg, 194021; St. Petersburg, 197022
补充文件
