Insulating GaN Epilayers Co-Doped with Iron and Carbon
- Autores: Lundin W.V.1, Sakharov A.V.1, Zavarin E.E.1, Zakgeim D.A.1, Lundina E.Y.1, Brunkov P.N.1, Tsatsulnikov A.F.2
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Afiliações:
- Ioffe Physical Technical Institute, Russian Academy of Sciences
- Submicron Heterostructures for Microelectronics Research and Engineering Center, Russian Academy of Sciences
- Edição: Volume 45, Nº 7 (2019)
- Páginas: 723-726
- Seção: Article
- URL: https://journal-vniispk.ru/1063-7850/article/view/208377
- DOI: https://doi.org/10.1134/S106378501907023X
- ID: 208377
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Resumo
The morphology and electrical properties of doped semi-insulating gallium nitride (GaN) epilayers have been studied. It was found that doping-induced improvement of the insulating properties of GaN epilayers with increased level of doping with carbon or iron is limited by the accompanying deterioration of surface morphology. The character of impurity-related morphology development is different for the two dopants. It is established that the co-doping with carbon and iron allows planarity of the GaN surface to be retained along with a significant improvement of insulating properties of epilayers.
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Sobre autores
W. Lundin
Ioffe Physical Technical Institute, Russian Academy of Sciences
Autor responsável pela correspondência
Email: lundin.vpegroup@mail.ioffe.ru
Rússia, St. Petersburg, 194021
A. Sakharov
Ioffe Physical Technical Institute, Russian Academy of Sciences
Email: lundin.vpegroup@mail.ioffe.ru
Rússia, St. Petersburg, 194021
E. Zavarin
Ioffe Physical Technical Institute, Russian Academy of Sciences
Email: lundin.vpegroup@mail.ioffe.ru
Rússia, St. Petersburg, 194021
D. Zakgeim
Ioffe Physical Technical Institute, Russian Academy of Sciences
Email: lundin.vpegroup@mail.ioffe.ru
Rússia, St. Petersburg, 194021
E. Lundina
Ioffe Physical Technical Institute, Russian Academy of Sciences
Email: lundin.vpegroup@mail.ioffe.ru
Rússia, St. Petersburg, 194021
P. Brunkov
Ioffe Physical Technical Institute, Russian Academy of Sciences
Email: lundin.vpegroup@mail.ioffe.ru
Rússia, St. Petersburg, 194021
A. Tsatsulnikov
Submicron Heterostructures for Microelectronics Research and Engineering Center, Russian Academy of Sciences
Email: lundin.vpegroup@mail.ioffe.ru
Rússia, St. Petersburg, 194021
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