Insulating GaN Epilayers Co-Doped with Iron and Carbon
- 作者: Lundin W.V.1, Sakharov A.V.1, Zavarin E.E.1, Zakgeim D.A.1, Lundina E.Y.1, Brunkov P.N.1, Tsatsulnikov A.F.2
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隶属关系:
- Ioffe Physical Technical Institute, Russian Academy of Sciences
- Submicron Heterostructures for Microelectronics Research and Engineering Center, Russian Academy of Sciences
- 期: 卷 45, 编号 7 (2019)
- 页面: 723-726
- 栏目: Article
- URL: https://journal-vniispk.ru/1063-7850/article/view/208377
- DOI: https://doi.org/10.1134/S106378501907023X
- ID: 208377
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详细
The morphology and electrical properties of doped semi-insulating gallium nitride (GaN) epilayers have been studied. It was found that doping-induced improvement of the insulating properties of GaN epilayers with increased level of doping with carbon or iron is limited by the accompanying deterioration of surface morphology. The character of impurity-related morphology development is different for the two dopants. It is established that the co-doping with carbon and iron allows planarity of the GaN surface to be retained along with a significant improvement of insulating properties of epilayers.
作者简介
W. Lundin
Ioffe Physical Technical Institute, Russian Academy of Sciences
编辑信件的主要联系方式.
Email: lundin.vpegroup@mail.ioffe.ru
俄罗斯联邦, St. Petersburg, 194021
A. Sakharov
Ioffe Physical Technical Institute, Russian Academy of Sciences
Email: lundin.vpegroup@mail.ioffe.ru
俄罗斯联邦, St. Petersburg, 194021
E. Zavarin
Ioffe Physical Technical Institute, Russian Academy of Sciences
Email: lundin.vpegroup@mail.ioffe.ru
俄罗斯联邦, St. Petersburg, 194021
D. Zakgeim
Ioffe Physical Technical Institute, Russian Academy of Sciences
Email: lundin.vpegroup@mail.ioffe.ru
俄罗斯联邦, St. Petersburg, 194021
E. Lundina
Ioffe Physical Technical Institute, Russian Academy of Sciences
Email: lundin.vpegroup@mail.ioffe.ru
俄罗斯联邦, St. Petersburg, 194021
P. Brunkov
Ioffe Physical Technical Institute, Russian Academy of Sciences
Email: lundin.vpegroup@mail.ioffe.ru
俄罗斯联邦, St. Petersburg, 194021
A. Tsatsulnikov
Submicron Heterostructures for Microelectronics Research and Engineering Center, Russian Academy of Sciences
Email: lundin.vpegroup@mail.ioffe.ru
俄罗斯联邦, St. Petersburg, 194021
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