Studying the Formation of Antireflection Coatings on Multijunction Solar Cells

Resumo

The formation of antireflection coating on multijunction solar cells based on A₃B₅ semiconductor heterostructures has been studied at the stage of structure surface processing by methods of plasmachemical, wet chemical, and ion-beam etching. A technology of creating antireflection coatings based on TiO_x/SiO₂ layers is developed. The obtained coatings are characterized by improved adhesion to the surface of heterostructure and reduced reflection coefficient of multijunction solar cells.