Studying the Formation of Antireflection Coatings on Multijunction Solar Cells


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Abstract

The formation of antireflection coating on multijunction solar cells based on A3B5 semiconductor heterostructures has been studied at the stage of structure surface processing by methods of plasmachemical, wet chemical, and ion-beam etching. A technology of creating antireflection coatings based on TiOx/SiO2 layers is developed. The obtained coatings are characterized by improved adhesion to the surface of heterostructure and reduced reflection coefficient of multijunction solar cells.

About the authors

A. V. Malevskaya

Ioffe Institute

Author for correspondence.
Email: amalevskaya@mail.ioffe.ru
Russian Federation, St. Petersburg, 194021

Yu. M. Zadiranov

Ioffe Institute

Email: amalevskaya@mail.ioffe.ru
Russian Federation, St. Petersburg, 194021

A. A. Blokhin

Ioffe Institute

Email: amalevskaya@mail.ioffe.ru
Russian Federation, St. Petersburg, 194021

V. M. Andreev

Ioffe Institute

Email: amalevskaya@mail.ioffe.ru
Russian Federation, St. Petersburg, 194021

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