Research on the Superhydrophilic Properties of Tio2 Films Formed by the Reactive Magnetron Sputtering Method and the Development of technology to Enhance them

Introduction. Currently, there is significant focus on researching metal oxide films and developing production technologies to create innovative devices widely utilized across various industries and scientific fields. Many of these devices rely on photoinduced processes, such as photocatalytic activity and superhydrophilicity. This study specifically examines the superhydrophilic property of titanium oxide films. The primary parameter used to assess this property is the contact angle, which approaches 0° in superhydrophilic surfaces. However, existing studies have not provided a comprehensive understanding of the mechanisms or causes behind superhydrophilicity on titanium oxide film surfaces. Therefore, achieving superhydrophilic films requires reliance on advanced technologies and production methods. Among these methods, reactive magnetron sputtering stands out due to its superior properties. The novelty of this study lies in demonstrating that titanium oxide films produced by reactive magnetron sputtering exhibit higher superhydrophilic properties compared to those previously reported. The aim of the work is to develop a technology for forming superhydrophilic titanium oxide films using reactive magnetron sputtering and experimentally identify parameters that affect their superhydrophilic properties. Conclusions. A series of samples was obtained using the UVN-71P 3 vacuum unit. Data analysis from all experiments revealed that the superhydrophilic properties are influenced by the thickness of the titanium oxide film, the concentration of argon and oxygen, the substrate temperature, and the substrate material. Additionally, the composition of the droplets affects the superhydrophilic properties. Parameters such as the distance between the target and the substrate (100 mm) and the target current (1.5 A) remained constant in all experiments.