Study of the Regimes of Scratching Probe Nanolithography

Abstract

This work presents experimental investigations into the film deposition of photoresist FP-383 by the centrifugal method and nanoscale profiling on them using scratching probe nanolithography (SPN). It is shown that a diminishing photoresist/thinner volume ratio (FP-383/RPF-383F) and an increase in rotational speed from 1000 to 5000 rpm lead to a decrease in film thickness from 1083 ± 17 to 20 ± 2 nm. For a photoresist/thinner volume ratio of 1: 15, an increase in rotational speed from 1000 to 5000 rpm leads to the film thickness and surface roughness decreasing from 50 ± 6 to 20 ± 2 nm and from 3.16 ± 0.20 to 2.23 ± 0.10 nm, respectively. The nanostructure-manufacturing technique on the thin photoresist film surface is developed using SPN, through which nanostructures with diameters from 380 ± 32 to 16 ± 3 nm are manufactured on 20-nm-thick FP-383 film. The results can be useful for developing nanostructures of micro- and nanoelectronics micro- and nanosystems using scanning probe microscope.