Effect of a low-temperature-grown GaAs layer on InAs quantum-dot photoluminescence
- 作者: Kosarev A.N.1,2, Chaldyshev V.V.1,2, Preobrazhenskii V.V.3, Putyato M.A.3, Semyagin B.R.3
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隶属关系:
- Ioffe Physical–Technical Institute
- Peter the Great Saint-Petersburg Polytechnic University
- Rzhanov Institute of Semiconductor Physics, Siberian Branch
- 期: 卷 50, 编号 11 (2016)
- 页面: 1499-1505
- 栏目: XX International Symposium “Nanophysics and Nanoelectronics”, Nizhny Novgorod, March 14–18, 2016
- URL: https://journal-vniispk.ru/1063-7826/article/view/198452
- DOI: https://doi.org/10.1134/S1063782616110154
- ID: 198452
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详细
The photoluminescence of InAs semiconductor quantum dots overgrown by GaAs in the low-temperature mode (LT-GaAs) using various spacer layers or without them is studied. Spacer layers are thin GaAs or AlAs layers grown at temperatures normal for molecular-beam epitaxy (MBE). Direct overgrowth leads to photoluminescence disappearance. When using a thin GaAs spacer layer, the photoluminescence from InAs quantum dots is partially recovered; however, its intensity appears lower by two orders of magnitude than in the reference sample in which the quantum-dot array is overgrown at normal temperature. The use of wider-gap AlAs as a spacer-layer material leads to the enhancement of photoluminescence from InAs quantum dots, but it is still more than ten times lower than that of reference-sample emission. A model taking into account carrier generation by light, diffusion and tunneling from quantum dots to the LT-GaAs layer is constructed.
作者简介
A. Kosarev
Ioffe Physical–Technical Institute; Peter the Great Saint-Petersburg Polytechnic University
Email: chald.gvg@mail.ioffe.ru
俄罗斯联邦, ul. Politekhnicheskaya 26, St. Petersburg, 194021; ul. Politekhnicheskaya 29, St. Petersburg, 195251
V. Chaldyshev
Ioffe Physical–Technical Institute; Peter the Great Saint-Petersburg Polytechnic University
编辑信件的主要联系方式.
Email: chald.gvg@mail.ioffe.ru
俄罗斯联邦, ul. Politekhnicheskaya 26, St. Petersburg, 194021; ul. Politekhnicheskaya 29, St. Petersburg, 195251
V. Preobrazhenskii
Rzhanov Institute of Semiconductor Physics, Siberian Branch
Email: chald.gvg@mail.ioffe.ru
俄罗斯联邦, pr. Akad. Lavrent’eva 13, Novosibirsk, 630090
M. Putyato
Rzhanov Institute of Semiconductor Physics, Siberian Branch
Email: chald.gvg@mail.ioffe.ru
俄罗斯联邦, pr. Akad. Lavrent’eva 13, Novosibirsk, 630090
B. Semyagin
Rzhanov Institute of Semiconductor Physics, Siberian Branch
Email: chald.gvg@mail.ioffe.ru
俄罗斯联邦, pr. Akad. Lavrent’eva 13, Novosibirsk, 630090
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