Effect of a low-temperature-grown GaAs layer on InAs quantum-dot photoluminescence


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Abstract

The photoluminescence of InAs semiconductor quantum dots overgrown by GaAs in the low-temperature mode (LT-GaAs) using various spacer layers or without them is studied. Spacer layers are thin GaAs or AlAs layers grown at temperatures normal for molecular-beam epitaxy (MBE). Direct overgrowth leads to photoluminescence disappearance. When using a thin GaAs spacer layer, the photoluminescence from InAs quantum dots is partially recovered; however, its intensity appears lower by two orders of magnitude than in the reference sample in which the quantum-dot array is overgrown at normal temperature. The use of wider-gap AlAs as a spacer-layer material leads to the enhancement of photoluminescence from InAs quantum dots, but it is still more than ten times lower than that of reference-sample emission. A model taking into account carrier generation by light, diffusion and tunneling from quantum dots to the LT-GaAs layer is constructed.

About the authors

A. N. Kosarev

Ioffe Physical–Technical Institute; Peter the Great Saint-Petersburg Polytechnic University

Email: chald.gvg@mail.ioffe.ru
Russian Federation, ul. Politekhnicheskaya 26, St. Petersburg, 194021; ul. Politekhnicheskaya 29, St. Petersburg, 195251

V. V. Chaldyshev

Ioffe Physical–Technical Institute; Peter the Great Saint-Petersburg Polytechnic University

Author for correspondence.
Email: chald.gvg@mail.ioffe.ru
Russian Federation, ul. Politekhnicheskaya 26, St. Petersburg, 194021; ul. Politekhnicheskaya 29, St. Petersburg, 195251

V. V. Preobrazhenskii

Rzhanov Institute of Semiconductor Physics, Siberian Branch

Email: chald.gvg@mail.ioffe.ru
Russian Federation, pr. Akad. Lavrent’eva 13, Novosibirsk, 630090

M. A. Putyato

Rzhanov Institute of Semiconductor Physics, Siberian Branch

Email: chald.gvg@mail.ioffe.ru
Russian Federation, pr. Akad. Lavrent’eva 13, Novosibirsk, 630090

B. R. Semyagin

Rzhanov Institute of Semiconductor Physics, Siberian Branch

Email: chald.gvg@mail.ioffe.ru
Russian Federation, pr. Akad. Lavrent’eva 13, Novosibirsk, 630090

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