Criterion for strong localization on a semiconductor surface in the Thomas–Fermi approximation

Аннотация

The localization behavior of a two-dimensional electron gas confined at the surface of a heavily doped semiconductor under conditions of the “natural” size effect in the space-charge region is investigated. The scattering of low-energy electrons by the chaotic potential formed at the surface by point charges of ionized impurities is analyzed and the electron mean free path is determined. A criterion for strong localization in this two-dimensional electron system is obtained on the basis of the Ioffe–Regel criterion.