Modification of the Ferromagnetic Properties of Si1 –xMnx Thin Films Synthesized by Pulsed Laser Deposition with a Variation in the Buffer-Gas Pressure


Дәйексөз келтіру

Толық мәтін

Ашық рұқсат Ашық рұқсат
Рұқсат жабық Рұқсат берілді
Рұқсат жабық Тек жазылушылар үшін

Аннотация

A series of thin films of Si1 –xMnx alloys with a thickness from 50 to 100 nm grown by pulsed laser deposition on an Al2O3 substrate in vacuum and in an argon atmosphere is investigated. The significant effect of the buffer-gas pressure in the sputtering chamber on the structural and magnetic homogeneity of the obtained films is shown. The conditions for the formation of a ferromagnetic phase with a high Curie temperature (>300 K) in the samples are studied. With the use of the Langmuir probe method, the threshold of ablation of a MnSi target by second harmonic radiation (λ = 532 nm) of a Nd:YAG Q-switch laser is determined. The time-of-flight curves for the plume ions are obtained with a change in the energy density at the target and argon pressure in the sputtering chamber. A nonmonotonic dependence of the probe time-of-flight signal amplitude on the argon pressure is established for high-energy particles of the plume.

Авторлар туралы

O. Novodvorsky

Institute of Laser and Information Technologies—Branch of the Federal Scientific Research Center
“Crystallography and Photonics”, Russian Academy of Sciences

Хат алмасуға жауапты Автор.
Email: onov@mail.ru
Ресей, Shatura, 140700

V. Mikhalevsky

Institute of Laser and Information Technologies—Branch of the Federal Scientific Research Center
“Crystallography and Photonics”, Russian Academy of Sciences

Email: onov@mail.ru
Ресей, Shatura, 140700

D. Gusev

Institute of Laser and Information Technologies—Branch of the Federal Scientific Research Center
“Crystallography and Photonics”, Russian Academy of Sciences

Email: onov@mail.ru
Ресей, Shatura, 140700

A. Lotin

Institute of Laser and Information Technologies—Branch of the Federal Scientific Research Center
“Crystallography and Photonics”, Russian Academy of Sciences

Email: onov@mail.ru
Ресей, Shatura, 140700

L. Parshina

Institute of Laser and Information Technologies—Branch of the Federal Scientific Research Center
“Crystallography and Photonics”, Russian Academy of Sciences

Email: onov@mail.ru
Ресей, Shatura, 140700

O. Khramova

Institute of Laser and Information Technologies—Branch of the Federal Scientific Research Center
“Crystallography and Photonics”, Russian Academy of Sciences

Email: onov@mail.ru
Ресей, Shatura, 140700

E. Cherebylo

Institute of Laser and Information Technologies—Branch of the Federal Scientific Research Center
“Crystallography and Photonics”, Russian Academy of Sciences

Email: onov@mail.ru
Ресей, Shatura, 140700

A. Drovosekov

Kapitza Institute for Physical Problems, Russian Academy of Sciences

Email: onov@mail.ru
Ресей, Moscow, 119334

V. Rylkov

National Research Center “Kurchatov Institute”; Fryazino Branch of the Kotelnikov Institute of Radioengineering and Electronics,
Russian Academy of Sciences

Email: onov@mail.ru
Ресей, Moscow, 123182; Fryazino, 141190

S. Nikolaev

National Research Center “Kurchatov Institute”

Email: onov@mail.ru
Ресей, Moscow, 123182

K. Chernoglazov

National Research Center “Kurchatov Institute”

Email: onov@mail.ru
Ресей, Moscow, 123182

K. Maslakov

Moscow State University

Email: onov@mail.ru
Ресей, Moscow, 119991

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