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Vol 53, No 8 (2019)

Obituaries

Zhores Ivanovich Alferov (March 15, 1930–March 1, 2019)

Semiconductors. 2019;53(8):1001-1003
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Nonelectronic Properties of Semiconductors (Atomic Structure, Diffusion)

Diffusion and Interaction of In and As Implanted into SiO2 Films

Tyschenko I.E., Voelskow M., Mikhaylov A.N., Tetelbaum D.I.

Abstract

By means of Rutherford backscattering spectrometry, electron microscopy, and energy-dispersive X-ray spectroscopy, the distribution and interaction of In and As atoms implanted into thermally grown SiO2 films to concentrations of about 1.5 at % are studied in relation to the temperature of subsequent annealing in nitrogen vapors in the range of T = 800–1100°C. It is found that annealing at T = 800–900°C results in the segregation of As atoms at a depth corresponding to the As+-ion range and in the formation of As nanoclusters that serve as sinks for In atoms. An increase in the annealing temperature to 1100°C yields the segregation of In atoms at the surface of SiO2 with the simultaneous enhanced diffusion of As atoms. The corresponding diffusion coefficient is DAs = 3.2 × 10–14 cm2 s–1.

Semiconductors. 2019;53(8):1004-1010
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Influence of the Charge State of Xenon Ions on the Depth Distribution Profile Upon Implantation into Silicon

Balakshin Y.V., Kozhemiako A.V., Petrovic S., Erich M., Shemukhin A.A., Chernysh V.S.

Abstract

Experimental depth distributions of the concentration of implanted xenon ions depending on their charge state and irradiation energy are presented. Xenon ions in charge states q = 1–20 and energies in the range from 50 to 400 keV are incorporated into single-crystal silicon. Irradiation is performed in the direction not coinciding with the crystallographic axes of the crystal to avoid the channeling effect. The ion fluence varies in the range of 5 × (1014–1015) ion/cm2. The irradiation by singly charged ions and investigation of the samples by Rutherford backscattering spectroscopy is performed using an HVEE acceleration complex at Moscow State University. Multiply charged ions are implanted using a FAMA acceleration complex at the Vinća Institute of Nuclear Sciences. The depth distribution profiles of the incorporated ions are found using Rutherford backscattering spectroscopy. Experimental results are correlated with computer calculations. It is shown that the average projective path of multiply charged ions in most cases is shorter when compared with the average projected path of singly charged ions and the results of computer modeling.

Semiconductors. 2019;53(8):1011-1017
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Electronic Properties of Semiconductors

Spin–Orbit Interaction and Carrier Mobility in a Longitudinal InSb Autosoliton under a Magnetic Field

Kamilov I.K., Stepurenko A.A., Gummetov A.E.

Abstract

A version of the spin–orbit interaction of orbitally moving and spin-oriented electrons in a longitudinal autosoliton in indium antimonide under a longitudinal magnetic field is proposed and considered. The additional energy gained by spin–orbit electrons due to this interaction is determined. Expressions for the change in the mobility during the orbital motion of electrons under a magnetic field and the additive mobility of spin-oriented electrons are derived and calculated. The coefficients of the mutual influence of changing electron mobility in the case of orbital motion and the additive mobility of spin-oriented electrons are calculated.

Semiconductors. 2019;53(8):1018-1023
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Effect of X-Ray Radiation on the Optical Properties of Photorefractive Bismuth-Silicate Crystals

Avanesyan V.T., Piskovatskova I.V., Stozharov V.M.

Abstract

The results of investigations of the optical-absorption spectra of bismuth-silicate (Bi12SiO20) single crystals are presented. The band-gap width and the characteristic Urbach energy are determined. The effect of preliminary X-ray irradiation on the behavior of the experimental spectral dependences and the values of the characteristic parameters induced by the bismuth-silicate defect structure is established.

Semiconductors. 2019;53(8):1024-1027
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Some Physical Properties of the New Intermetallic Compound NbCd2

Tuleushev Y.Z., Zhakanbaev E.A., Migunova A.A., Nicenko A.B., Volodin V.N.

Abstract

Solid solutions of cadmium in niobium and NbCd2 phase are formed by magnetron sputtering and coprecipitation on substrates moving relative to the flow of Nb and Cd particles. The NbCd2 phase can be described by a tetragonal unit cell with the parameters a = 0.84357 nm, c = 0.54514 nm, and c/a = 0.6426. A very high hole concentration in NbCd2 is established by studying the coating absorption and transmission spectra corresponding to the intermetallic-compound composition near the fundamental absorption edge, determining the band gap, and measuring the carrier mobility. Such a concentration is characteristic of a strongly degenerate semiconductor or metal. The band gap is determined to be 1.26 eV. The variation in the concentration of carriers and their mobility depending on the cadmium concentration in coatings of the Nb–Cd system confirms the occurrence of the NbCd2 phase.

Semiconductors. 2019;53(8):1028-1032
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Surfaces, Interfaces, and Thin Films

Nanostructured ITO/SiO2 Coatings

Markov L.K., Pavluchenko A.S., Smirnova I.P.

Abstract

The influence of a SiO2 layer deposited onto nanostructured transparent conductive films of indium and tin oxide (ITO) on their optical characteristics is investigated. For this purpose, SiO2 films of various thicknesses are deposited by magnetron sputtering on samples with ITO films containing whiskers of preferentially vertical orientation and possessing steadily decreasing reflectance. It is shown that this makes it possible to attain noticeable coating antireflection under the condition of the uniform overgrowth of ITO whiskers by the SiO2 layer. The influence of the SiO2 layer on the optical characteristics of a dense unstructured ITO film is also investigated. The results for structured and unstructured ITO/SiO2 coatings with identical material mass contents are compared. It is noted that due to the liability of ITO material to degradation during operation in the composition of transparent conductive contacts, the results can also be interesting for the formation of coatings more resistant to the effect of the environment.

Semiconductors. 2019;53(8):1033-1037
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Semiconductor Structures, Low-Dimensional Systems, and Quantum Phenomena

Observation of Regions of Negative Differential Conductivity and Current Generation during Tunneling through Zero-Dimensional Defect Levels of the h-BN Barrier in Graphene/h-BN/Graphene Heterostructures

Khanin Y.N., Vdovin E.E., Mishchenko A., Novoselov K.S.

Abstract

Tunneling and magnetic tunneling are investigated in graphene/h-BN/graphene van der Waals heterosystems. Two new types of systems are found, in which negative differential conductivity regions are implemented due to resonant tunneling through defect levels in the h-BN barrier, and current caused by their presence is generated.

Semiconductors. 2019;53(8):1038-1041
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On the Theory of Plasmon–Excitons: An Estimate of the Coupling Constant and the Optical Spectrum

Averkiev N.S., Korotchenkov A.V., Kosobukin V.A.

Abstract

The structure of the optical spectra related to the resonant interaction of quasi-two-dimensional excitons and localized plasmons is investigated theoretically. The constant of plasmon–exciton coupling is estimated in a model considering a semiconductor quantum well close to a layer of metal nanoparticles in an adjacent dielectric medium. Numerical calculations carried out for GaAs/Ag and ZnO/Al nanosystems indicate that near the plasmon–exciton resonance the spectrum features a double-peak structure which exhibits the plasmon-excitonic anticrossing behavior upon detuning from exact resonance.

Semiconductors. 2019;53(8):1042-1047
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Template Synthesis of Monodisperse Submicrometer Spherical Nanoporous Silicon Particles

Kurdyukov D.A., Feoktistov N.A., Kirilenko D.A., Smirnov A.N., Davydov V.Y., Golubev V.G.

Abstract

Monodisperse spherical nanoporous silicon (np-Si) particles of submicrometer size are fabricated with mesoporous silica particles as a template. Silicon is synthesized within the mesopores of monodisperse silica particles by the thermal decomposition of monosilane. Then, the template material (a-SiO2) is removed by wet etching. The particles obtained have a small root-mean-square size scatter (no more than 10%) and large specific surface area (250 m2 g–1) and pore volume (0.5 cm3 g–1). It is shown that np-Si particles exhibit photoluminescence in the visible and near-IR (infrared) spectral ranges.

Semiconductors. 2019;53(8):1048-1053
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Investigation of the Current–Voltage Characteristics of New MnO2/GaAs(100) and V2O5/GaAs(100) Heterostructures Subjected to Heat Treatment

Sladkopevtsev B.V., Kotov G.I., Arsentyev I.N., Shashkin I.S., Mittova I.Y., Tomina E.V., Samsonov A.A., Kostenko P.V.

Abstract

Complex oxide films with a thickness of about 200 nm are formed during the thermal oxidation of GaAs with magnetron-deposited V2O5 and MnO2 nanolayers. The electrical parameters of the films (reverse-bias breakdown voltage and current density) are determined by the method of current–voltage (IV) characteristics at room temperature in the bias range from –5 to +5 V, and their composition and surface morphology are investigated. It is shown that V2O5 facilitates the more intense (in comparison with MnO2) chemical bonding of arsenic at the internal interface with the formation of As2O5. As a result, thermally oxidized V2O5/GaAs heterostructures exhibit higher breakdown voltages.

Semiconductors. 2019;53(8):1054-1059
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Dependence of the Spontaneous Luminescence Intensity in ZnO Nanorods on their Length

Gruzintsev A.N., Redkin A.N., Yakimov E.E.

Abstract

The influence of the length of ZnO nanorods (500 nm in diameter) on the mode structure and spontaneous luminescence in the ultraviolet spectral region is studied by optical luminescence microscopy. It is shown that individual nanorods with a metal mirror on one face exhibit only two or three laser modes in the case of short nanocavity lengths (8–30 μm). Different values of the optical losses of the longitudinal and transverse waveguide modes are established for a ZnO nanorod lying on a glassy substrate. The quadratic dependence of the spontaneous luminescence intensity on the rod length can be attributed to improvement of the optical quality factor Q of bound longitudinal modes of light within longer rods (the Purcell effect).

Semiconductors. 2019;53(8):1060-1065
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Energy Expenditure Upon the Formation of the Elastically Stressed State in the Layers of a Step-Graded Metamorphic Buffer in a Heterostructure Grown on a (001) GaAs Substrate

Aleshin A.N., Bugaev A.S., Ruban O.A., Saraikin V.V., Tabachkova N.Y., Shchetinin I.V.

Abstract

On the basis of data on X-ray structural analysis performed by the method of reciprocal-space mapping and investigations using secondary-ion mass spectrometry and transmission electron microscopy, it is shown that vertical compressive stresses also arise in a multilayer epitaxial heterostructure comprised of a step-graded metamorphic buffer along with lateral compressive stresses. The cause of the appearance of vertical stresses is the effect of interlayer hardening, which arises due to the deceleration of fragments of glide dislocations by interphase boundaries. Analysis performed within the framework of the linear theory of elasticity shows that the elastically stressed state of the buffer steps is similar to the state that can be achieved as a result of a two-stage deformation process: bulk and biaxial compression. Bulk compression leads to large energy expenditures in the formation of the structure of the buffer steps, which is reflected, in particular, in violation of the coherence between the dislocation-free and the underlying layers.

Semiconductors. 2019;53(8):1066-1074
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Effect of Thermal Annealing on the Photovoltaic Properties of GaP/Si Heterostructures Fabricated by Plasma-Enhanced Atomic Layer Deposition

Uvarov A.V., Zelentsov K.S., Gudovskikh A.S.

Abstract

The effect of thermal annealing on the photovoltaic properties of a GaP/Si heterostructures obtained by plasma-enhanced atomic layer deposition under different conditions is examined. It is shown that in the structures containing amorphous GaP, annealing at 550°C leads to a sharp decrease in the quantum efficiency and open-circuit voltage, while in the structures with microcrystalline GaP on an epitaxial sublayer, the photovoltaic characteristics are improved. Annealing at a temperature of 750°C improves the photovoltaic characteristics in all the structures due to the diffusion of phosphorus atoms from GaP to Si and leads to the formation of a layer with n-type conductivity in the substrate. As the annealing temperature is increased to 900°C, the carrier lifetime in the silicon substrate decreases. It is shown that the atomic-layer-deposition technique is promising for the formation of a GaP nucleation layer on the surface of silicon before subsequent epitaxial growth.

Semiconductors. 2019;53(8):1075-1081
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Microcrystalline, Nanocrystalline, Porous, and Composite Semiconductors

On the Synthesis and Photoluminescence and Cathodoluminescence Properties of CdSe, CdTe, PbS, InSb, and GaAs Colloidal Quantum Dots

Zhukov N.D., Kryl’skiy D.V., Shishkin M.I., Khazanov A.A.

Abstract

Quantum dots of the group of wide-gap and narrow-gap semiconductors are synthesized and investigated under identical conditions, which makes it possible to perform the comparative analysis and modeling of the mechanisms of radiative recombination and luminescence, for which a stable exciton bond between the electron and hole has an important role. Exciton states are unstable for quantum dots without a shell and narrow-gap semiconductors, which leads to a substantial decrease in the probability of radiative recombination and, correspondingly, the quantum yield of luminescence. The experimental values of the spectral position of the luminescence maximum for quantum dots with clear manifestation of the exciton recombination mechanism noticeably shift to the long-wavelength region with respect to the calculated ones. In calculations and analysis, we use the effective electron mass for bulk semiconductors. The observed good correspondence of the calculated values of the maximum and spectral band with the experiment can mean that quantum dots have a long-range order crystalline structure similar to that one observed in single crystals and polycrystals.

Semiconductors. 2019;53(8):1082-1087
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Effect of Bismuth on the Properties of Elastically Stressed AlGaInAsP〈Bi〉/InP Heterostructures

Lunina M.L., Lunin L.S., Alfimova D.L., Pashchenko A.S., Danilina E.M., Nefedov V.V.

Abstract

The results of growing elastically stressed AlGaInAsP〈Bi〉 thin epitaxial layers from the liquid phase on indium phosphide substrates in a temperature-gradient field are discussed. The effect of bismuth on the structural perfection, the luminescence properties, and the external quantum yield of AlGaInAsP〈Bi〉/InP heterostructures is investigated.

Semiconductors. 2019;53(8):1088-1091
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Relaxation, Thermal, and Interphase Effects in Polymer–Ferroelectric-Piezoelectric Ceramic Composites of Different Structures

Kurbanov M.A., Ramazanova I.S., Dadashov Z.A., Mamedov F.I., Huseynova G.K., Yusifova U.V., Tatardar F.N., Faraczade I.A.

Abstract

The relaxation and thermal processes and interphase phenomena in composites based on ferroelectrics and a polymer matrix are studied. It is shown that the charge stabilized at the interface of the composite during its electrothermopolarization is mainly determined by the structure of the polymer matrix and the piezoelectric phase. The results obtained make it possible to reveal the main factors affecting the piezoelectric properties of the heterogeneous polymer–ferroelectric ceramic system. Polyolefins and fluorine-containing polar polymers are used as the organic phase, and ferroelectric ceramics of rhombohedral, tetragonal, and mixed structures serve as the inorganic phase. The relaxation processes and interphase phenomena are studied using a differential scanning calorimeter, and the charge state is analyzed by recording the thermally stimulated depolarization current. The charge-state stability is determined by the electret potential difference of the composites. The molecular relaxation is analyzed by the dielectric method. It is established that the composites in which the interphase interaction is more pronounced are characterized by high piezoelectric properties.

Semiconductors. 2019;53(8):1092-1098
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Physics of Semiconductor Devices

Evaluation of the Impact of Surface Recombination in Microdisk Lasers by Means of High-Frequency Modulation

Blokhin S.A., Kulagina M.M., Guseva Y.A., Mintairov S.A., Kalyuzhnyy N.A., Mozharov A.M., Zubov F.I., Maximov M.V., Zhukov A.E., Moiseev E.I., Kryzhanovskaya N.V.

Abstract

Microdisk lasers 10–30 μm in diameter operating at room temperature without thermal stabilization and with an active region based on nanostructures of hybrid dimensionality—quantum wells–dots—are investigated. High-frequency measurements of the microlaser response are performed in the direct small-signal modulation mode, which makes it possible to establish the parameters of the operating speed and analyze their dependence on the microlaser diameter. It is found that the K factor is (0.8 ± 0.2) ns, which corresponds to optical losses of ~6 cm–1, and no regular dependence on the diameter is observed. It is found that the low-frequency component of the damping coefficient of relaxation oscillations is inversely proportional to the diameter. This character of the dependence evidences a decrease in the carrier lifetime in small-diameter microcavities, which can be associated with the prevalence of nonradiative recombination on their side walls.

Semiconductors. 2019;53(8):1099-1103
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Influence of Output Optical Losses on the Dynamic Characteristics of 1.55-μm Wafer-Fused Vertical-Cavity Surface-Emitting Lasers

Blokhin S.A., Bobrov M.A., Blokhin A.A., Kuzmenkov A.G., Maleev N.A., Ustinov V.M., Kolodeznyi E.S., Rochas S.S., Babichev A.V., Novikov I.I., Gladyshev A.G., Karachinsky L.Y., Denisov D.V., Voropaev K.O., Ionov A.S., Egorov A.Y.

Abstract

The results of studying the dynamic characteristics of 1.55-μm single-mode vertical-cavity surface-emitting lasers (VCSELs) formed by the fusion of wafers of high-quality Bragg reflectors and an active region based on thin highly strained InGaAs/InAlGaAs quantum wells are presented. It is found that the proposed design of the active region and optical microcavity of the laser make it possible in principle to attain a high level of differential laser gain in the temperature range of 20°C–85°C, but weak electron localization leads to an increase in gain compression at elevated temperatures. Due to this fact, the VCSEL modulation bandwidth at 20°C can be increased from 9.2 to 11.5 GHz due to an increase in output optical losses, while the modulation bandwidth at 85°C does not exceed 8.5 GHz, depends weakly on the output optical losses, and is mainly limited by the optical-gain saturation.

Semiconductors. 2019;53(8):1104-1109
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Module of Laser-Radiation (λ = 1064 nm) Photovoltaic Converters

Khvostikov V.P., Kalyuzhnyy N.A., Mintairov S.A., Potapovich N.S., Sorokina S.V., Shvarts M.Z.

Abstract

The results of a study and the development of a module designed for energy transmission via atmospheric channels are presented. The four-cell module based on single-junction metamorphic InGaAs/GaAs converters grown by metal-organic vapor-phase epitaxy has an open-circuit voltage of ~3 V. It is shown that the monochromatic efficiency (at a wavelength of 1064 nm) of this module is 31.5% under exposure to a Xe-lamp with a radiation power of 1.5 W/cm2.

Semiconductors. 2019;53(8):1110-1113
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Sensing Amorphous/Crystalline Silicon Surface Passivation by Attenuated Total Reflection Infrared Spectroscopy of Amorphous Silicon on Glass

Abolmasov S.N., Abramov A.S., Semenov A.V., Shakhray I.S., Terukov E.I., Malchukova E.V., Trapeznikova I.N.

Abstract

Attenuated total reflection Fourier transform infrared (ATR FTIR) spectroscopy and effective lifetime measurements have been used to characterize amorphous/crystalline silicon surface passivation in silicon heterojunction solar cells. The comparative studies show a strong link between microstructure factor R* and effective lifetime of amorphous silicon (a-Si:H) passivation layers incorporating an interface buffer layer, which prevents the epitaxial growth. It is demonstrated that thin a-Si:H films deposited on glass can be used as ATR substrates in this case. The obtained results show that a-Si:H films with R* close to 0.1 are required for manufacturing of high-efficiency (>23%) silicon heterojunction solar cells.

Semiconductors. 2019;53(8):1114-1119
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Fabrication, Treatment, and Testing of Materials and Structures

Structural and Morphological Properties of Hybrid Heterostructures Based on GaN Grown on a Compliant por-Si(111) Substrate

Seredin P.V., Goloshchapov D.L., Zolotukhin D.S., Lenshin A.S., Mizerov A.M., Arsentyev I.N., Leiste H., Rinke M.

Abstract

The possibility of synthesizing integrated GaN/por-Si heterostructures by plasma-assisted molecular beam epitaxy without an A1N/Si buffer layer is demonstrated. The beneficial effect of the high-temperature nitridation of a silicon substrate before GaN growth on the crystal quality of the GaN/Si layers is shown. It is established that, to obtain two-dimensional GaN layers on Si(111), it is reasonable to use compliant por-Si substrates and low-temperature GaN seed layers with a 3D morphology synthesized by plasma-assisted molecular beam epitaxy at relatively low substrate temperatures under stoichiometric conditions and upon enrichment with nitrogen. In this case, a self-assembled array of GaN seed nanocolumns with a fairly uniform diameter distribution forms on the por-Si substrate surface. The basic GaN layers, in turn, should be grown at a high temperature under stoichiometric conditions upon enrichment with gallium, upon which the coalescence of nucleated GaN nanocolumns and growth of a continuous two-dimensional GaN layer are observed. The use of compliant Si substrates is a relevant approach for forming GaN-based semiconductor device heterostructures by plasma-assisted molecular beam epitaxy.

Semiconductors. 2019;53(8):1120-1130
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Molecular-Beam Epitaxy of Two-Dimensional GaSe Layers on GaAs(001) and GaAs(112) Substrates: Structural and Optical Properties

Sorokin S.V., Avdienko P.S., Sedova I.V., Kirilenko D.A., Yagovkina M.A., Smirnov A.N., Davydov V.Y., Ivanov S.V.

Abstract

The results of studies of the structural and optical properties of two-dimensional GaSe layers grown by molecular-beam epitaxy on GaAs(001) and GaAs(112) substrates using a valve cracking cell for the Se source are reported. The influence of the MBE growth parameters (the substrate temperature, Ga flux intensity, Se/Ga incident flux ratio) on the surface morphology of the layers is studied. By means of transmission electron microscopy, electron diffraction technique, and Raman spectroscopy, it is shown that the structure of the GaSe layers corresponds to the γ-GaSe polytype. From X-ray diffraction analysis, it is established that there exist α-Ga2Se3 inclusions in the GaSe layers grown under conditions of high enrichment of the growth surface with Se.

Semiconductors. 2019;53(8):1131-1137
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Submonolayer InGaAs/GaAs Quantum Dots Grown by MOCVD

Aleshkin V.Y., Baidus N.V., Dubinov A.A., Kudryavtsev K.E., Nekorkin S.M., Kruglov A.V., Reunov D.G.

Abstract

The mode of the growth of InGaAs quantum dots by MOS-hydride epitaxy on GaAs substrates without a deviation and with a deviation of 2° is selected for laser structures emitting at wavelengths above 1.2 μm at room temperature. As a result, a quantum-dot density of 4 × 1010 cm–2 is achieved. Stimulated emission is observed in laser structures with seven layers of quantum dots at a wavelength of 1.06 μm at liquid-nitrogen temperature. The threshold power density of optical pumping is about 5 kW/cm2.

Semiconductors. 2019;53(8):1138-1142
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