Автор туралы ақпарат
Chernysh, V. S.
Шығарылым | Бөлім | Атауы | Файл |
Том 51, № 6 (2017) | Nonelectronic Properties of Semiconductors (Atomic Structure, Diffusion) | Study of the distribution profile of iron ions implanted into silicon | |
Том 53, № 8 (2019) | Nonelectronic Properties of Semiconductors (Atomic Structure, Diffusion) | Influence of the Charge State of Xenon Ions on the Depth Distribution Profile Upon Implantation into Silicon |