Автор туралы ақпарат

Chernysh, V. S.

Шығарылым Бөлім Атауы Файл
Том 51, № 6 (2017) Nonelectronic Properties of Semiconductors (Atomic Structure, Diffusion) Study of the distribution profile of iron ions implanted into silicon
Том 53, № 8 (2019) Nonelectronic Properties of Semiconductors (Atomic Structure, Diffusion) Influence of the Charge State of Xenon Ions on the Depth Distribution Profile Upon Implantation into Silicon