Informaçao sobre o Autor
Chernysh, V. S.
| Edição | Seção | Título | Arquivo |
| Volume 51, Nº 6 (2017) | Nonelectronic Properties of Semiconductors (Atomic Structure, Diffusion) | Study of the distribution profile of iron ions implanted into silicon | |
| Volume 53, Nº 8 (2019) | Nonelectronic Properties of Semiconductors (Atomic Structure, Diffusion) | Influence of the Charge State of Xenon Ions on the Depth Distribution Profile Upon Implantation into Silicon |